Low-frequency noise study of n-MOSFETs with HfO2 gate dielectric

Simoen, EddyEddySimoenMercha, AbdelkarimAbdelkarimMerchaPantisano, LuigiLuigiPantisanoClaeys, CorCorClaeysYoung, EdwardEdwardYoung2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8151Low-frequency noise study of n-MOSFETs with HfO2 gate dielectricMeeting abstract