Santaclara, J. G.J. G.SantaclaraMaslow, M. J.M. J.MaslowThiam, ArameArameThiamFranke, Joern-HolgerJoern-HolgerFrankeSchleicher, FilipFilipSchleicherBlanc, RomualdRomualdBlancBezard, PhilippePhilippeBezardMoussa, AlainAlainMoussaHendrickx, EricEricHendrickxWong, PatrickPatrickWong2022-06-022022-05-222022-06-022021978-1-5106-4552-30277-786XWOS:000792657300005https://imec-publications.be/handle/20.500.12860/39868Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line SpaceProceedings paper10.1117/12.2601839978-1-5106-4553-0WOS:000792657300005