Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool

Eitoku, AtsuroAtsuroEitokuSnow, JimJimSnowVos, RitaRitaVosSato, M.M.SatoHirae, S.S.HiraeNakajima, K.K.NakajimaNonomura, M.M.NonomuraImai, M.M.ImaiMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7551Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning toolProceedings paper