Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning

Le, Quoc ToanQuoc ToanLeKesters, ElsElsKestersDecoster, StefanStefanDecosterChan, BTBTChanNguyen, Mai PhuongMai PhuongNguyenConard, ThierryThierryConardVanleenhove, AnjaAnjaVanleenhoveHolsteyns, FrankFrankHolsteynsDe Gendt, StefanStefanDe Gendt2021-10-232021-10-2320162162-8769https://imec-publications.be/handle/20.500.12860/26880Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaningJournal articlehttp://jss.ecsdl.org/content/5/3/N5.short