Physical resist models and their calibration: their readiness for accurate EUV lithography simulation

Klostermann, Ulrich K.Ulrich K.KlostermannMuelders, ThomasThomasMueldersSchmoeller, ThiomasThiomasSchmoellerLorusso, GianGianLorussoHendrickx, EricEricHendrickx2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17384Physical resist models and their calibration: their readiness for accurate EUV lithography simulationProceedings paper