In-situ spatial analysis of RF voltage during plasma etching

Milenin, AlexeyAlexeyMileninde Marneffe, Jean-FrancoisJean-Francoisde MarneffeStruyf, HerbertHerbertStruyfBoullart, WernerWernerBoullart2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14168In-situ spatial analysis of RF voltage during plasma etchingProceedings paper