Defect-free Si thinning by in-situ HCl vapour etching

Loo, RogerRogerLooCaymax, MattyMattyCaymaxRichard, OlivierOlivierRichardVerheyen, PeterPeterVerheyenCollaert, NadineNadineCollaert2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6551Defect-free Si thinning by in-situ HCl vapour etchingOral presentation