A comparative study of copper drift diffusion in plasma deposited A-Sic:H and silicon nitride

Lanckmans, FilipFilipLanckmansGray, WilliamWilliamGrayBrijs, BertBertBrijsMaex, KarenKarenMaex2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4513A comparative study of copper drift diffusion in plasma deposited A-Sic:H and silicon nitrideOral presentation