Atomic layer deposition of Hf-based materials in semiconductor applications

Nyns, LauraLauraNynsDelabie, AnneliesAnneliesDelabieHeyns, MarcMarcHeynsPourtois, GeoffreyGeoffreyPourtoisVan Elshocht, SvenSvenVan ElshochtVinckier, ChrisChrisVinckierDe Gendt, StefanStefanDe Gendt2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14231Atomic layer deposition of Hf-based materials in semiconductor applicationsMeeting abstract