Kesters, ElsElsKestersOhashi, TakuyaTakuyaOhashiWada, YYWadaSugawara, MMSugawaraKumagai, TTKumagaiLe, Quoc ToanQuoc ToanLeRip, JensJensRipOniki, YusukeYusukeOnikiHolsteyns, FrankFrankHolsteyns2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33269Development of Metal Free Wet Etching Chemical for Ruthenium InterconnectMeeting abstract