Chemical vapour deposition of Si:C and Si:CP thin films using disilane

Dhayalan, Sathish KumarSathish KumarDhayalanRosseel, ErikErikRosseelHikavyy, AndriyAndriyHikavyyLoo, RogerRogerLooVandervorst, WilfriedWilfriedVandervorst2021-10-212021-10-212013-10https://imec-publications.be/handle/20.500.12860/22266Chemical vapour deposition of Si:C and Si:CP thin films using disilaneMeeting abstract