Fallica, RobertoRobertoFallicaHeo, SeonggilSeonggilHeoSuh, Hyo SeonHyo SeonSuhDe Simone, DaniloDaniloDe Simone2025-07-072025-05-112025-07-072024978-1-5106-8155-20277-786XWOS:001467876500020https://imec-publications.be/handle/20.500.12860/45643PFAS-free EUV rinse for advanced technology nodesProceedings paper10.1117/12.3034706978-1-5106-8156-9WOS:001467876500020