Integration of low-k dielectric films in damascene processes

Hoofman, RomanoRomanoHoofmanNguyen Hoang, VietVietNguyen HoangArnal, V.V.ArnalBroekaart, M.M.BroekaartGosset, L.G.L.G.GossetBesling, W.F.A.W.F.A.BeslingFayolle, M.M.FayolleIacopi, FrancescaFrancescaIacopi2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12305Integration of low-k dielectric films in damascene processesBook chapter