Baklanov, MikhaïlMikhaïlBaklanovBraginsky, O.V.O.V.BraginskyKovalev, A.S.A.S.KovalevLopaev, D.V.D.V.LopaevMankelevich, Y.A.Y.A.MankelevichRakhimova, T.V.T.V.RakhimovaMalykhin, E.M.E.M.MalykhinProshina, O.V.O.V.ProshinaRakhimov, A.T.A.T.RakhimovVasilieva, A.N.A.N.VasilievaVoloshin, D.G.D.G.VoloshinZyryanov, S.M.S.M.Zyryanov2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/14934Recombination of O and H atoms with low-k SiOCH films pretreated in He plasmaProceedings paper