Swerts, JohanJohanSwertsArmini, SilviaSilviaArminiCarbonell, LaureLaureCarbonellDelabie, AnneliesAnneliesDelabieFranquet, AlexisAlexisFranquetMertens, SofieSofieMertensPopovici, Mihaela IoanaMihaela IoanaPopoviciSchaekers, MarcMarcSchaekersWitters, ThomasThomasWittersTokei, ZsoltZsoltTokeiBeyer, GeraldGeraldBeyerVan Elshocht, SvenSvenVan ElshochtGravey, VirginieVirginieGraveyCockburn, AndrewAndrewCockburnShah, KavitaKavitaShahAubuchon, JosephJosephAubuchon2021-10-202021-10-2020120734-2101https://imec-publications.be/handle/20.500.12860/21574Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applicationsJournal articlehttp://avspublications.org/jvsta/resource/1/jvtad6/v30/i1/p01A103_s1