Zotovich, AlexeyAlexeyZotovichEl Otell, ZiadZiadEl OtellSutton, YvonneYvonneSuttonBraithwaite, N. St. J.N. St. J.Braithwaitede Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhailMikhailBaklanov2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27679Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmasMeeting abstract