Hendrickx, EricEricHendrickxLorusso, GianGianLorussoJiang, JiongJiongJiangChen, LuoqiLuoqiChenLui, WeiWeiLuiVan Setten, EelcaEelcaVan SettenHansen, SteveSteveHansen2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15457Accurate models for EUV lithographyProceedings paper