Measuring resist-induced contrast loss using EUV interference lithography

Langner, AndreasAndreasLangnerSolak, Harun H.Harun H.SolakGronheid, RoelRoelGronheidvan Setten, EelcoEelcovan SettenAuzelyte, VaidaVaidaAuzelyteEkinci, YasinYasinEkincivan Ingen Schenau, KoenKoenvan Ingen SchenauFeenstra, KeesKeesFeenstra2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17429Measuring resist-induced contrast loss using EUV interference lithographyProceedings paper