Jonckheere, RikRikJonckheereVan Den Heuvel, DieterDieterVan Den HeuvelPacco, AntoineAntoinePaccoPollentier, IvanIvanPollentierBaudemprez, BartBartBaudemprezJehoul, ChristianeChristianeJehoulHermans, JanJanHermansHendrickx, EricEricHendrickx2021-10-222021-10-222014-07https://imec-publications.be/handle/20.500.12860/24014Towards reduced impact of EUV mask defectivity on waferProceedings paperhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2070045