Challenges for atomic layer deposition in CMOS devices with high-mobility channel materials

Delabie, AnneliesAnneliesDelabieAlian, AliRezaAliRezaAlianBellenger, FlorenceFlorenceBellengerCaymax, MattyMattyCaymaxConard, ThierryThierryConardFranquet, AlexisAlexisFranquetSioncke, SonjaSonjaSionckeVandervorst, WilfriedWilfriedVandervorstVan Elshocht, SvenSvenVan ElshochtHeyns, MarcMarcHeynsMeuris, MarcMarcMeuris2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15216Challenges for atomic layer deposition in CMOS devices with high-mobility channel materialsProceedings paper