Vitchev, R.G.R.G.VitchevPireaux, J.J.J.J.PireauxConard, ThierryThierryConardBender, HugoHugoBenderWolstenholme, J.J.WolstenholmeDefranoux, C.C.Defranoux2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9882X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surfaceJournal article