Komori, KanaKanaKomoriRip, JensJensRipYoshida, YukifumiYukifumiYoshidaWostyn, KurtKurtWostynSebaai, FaridFaridSebaaiLiu, Wen DarWen DarLiuLee, Yi ChiaYi ChiaLeeSekiguchi, RyoRyoSekiguchiMertens, HansHansMertensHikavyy, AndriyAndriyHikavyyHolsteyns, FrankFrankHolsteynsHoriguchi, NaotoNaotoHoriguchi2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/31072SiGe vs. Si selective wet etchingfor Si gate-all-aroundProceedings paperhttps://doi.org/10.4028/www.scientific.net/SSP.282.107