Bruls, R.R.BrulsUitterdijk, T.T.UitterdijkCicilia, O.O.CiciliaDe Bisschop, PeterPeterDe BisschopKocsis, MichaelMichaelKocsisGrenville, A.A.GrenvilleVan Peski, C.C.Van PeskiEngelstad, R.R.EngelstadChang, J.J.ChangCotte, E.E.CotteOkada, K.K.OkadaOhta, K.K.OhtaMishiro, H.H.MishiroKikugawa, S.S.Kikugawa2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8643Hard pellicle investigation for 157 nm lithography: impact on overlayProceedings paper