Determining physical properties of EpoClad negative photoresist for use in MEMS applications

Gijsenbergh, PieterPieterGijsenberghWouters, KristofKristofWoutersVanstreels, KrisKrisVanstreelsPuers, RobertRobertPuers2021-10-192021-10-1920110960-1317https://imec-publications.be/handle/20.500.12860/18958Determining physical properties of EpoClad negative photoresist for use in MEMS applicationsJournal article