Combinatorial methodology for the exploration of metal gate electrodes on HfO2 for the advanced gate stack

Chang, K.S.K.S.ChangGreen, M.L.M.L.GreenSuehle, J.J.SuehleHattrick-Simpers, J.J.Hattrick-SimpersTakeuchi, I.I.TakeuchiOhmori, K.K.OhmoriChikyow, T.T.ChikyowDe Gendt, StefanStefanDe GendtMajhi, P.P.Majhi2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13495Combinatorial methodology for the exploration of metal gate electrodes on HfO2 for the advanced gate stackMeeting abstract