In-line atomic resolution local nanotopography variation metrology for CMP process

Kim, Tae-GonTae-GonKimHeylen, NancyNancyHeylenKim, Soon-WookSoon-WookKimVandeweyer, TomTomVandeweyerJo, Ah-jinAh-jinJoLee, Ju SukJu SukLeeAhn, Byoung-WoonByoung-WoonAhnCho, Sang-JoonSang-JoonChoPark, Sang-ilSang-ilParkImer, BerndBerndImerShmidt, SebastianSebastianShmidt2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28685In-line atomic resolution local nanotopography variation metrology for CMP processProceedings paperhttps://ieeexplore.ieee.org/document/8237955/