Erdman, AndreasAndreasErdmanEvanschitzky, PeterPeterEvanschitzkyBret, TristanTristanBretJonckheere, RikRikJonckheere2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20656Mask defects in EUV lithography: UnderstandingOral presentation