Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma

Thompson, HeikeHeikeThompsonVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaexVan Ammel, AnnemieAnnemieVan AmmelBeyer, GeraldGeraldBeyerCoenegrachts, BartBartCoenegrachtsVervoort, IwanIwanVervoortWaeterloos, JoostJoostWaeterloosStruyf, HerbertHerbertStruyfPalmans, RogerRogerPalmansForester, LynnLynnForester2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3880Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasmaProceedings paper