Ghorbani, LeilaLeilaGhorbaniPavel, AlexandruAlexandruPavelDekkers, HaroldHaroldDekkersDe Gendt, StefanStefanDe GendtKundu, ShreyaShreyaKundu2026-05-062026-05-0620252574-0970https://imec-publications.be/handle/20.500.12860/59346engHard Mask Strategies in Nanoscale Patterning of Mg-Based Oxide Semiconductors: Implications for Advanced Device ArchitecturesJournal article10.1021/acsanm.5c04430WOS:001636592800001ETCHING CHARACTERISTICS2574-0970