Adelmann, ChristophChristophAdelmannPopovici, Mihaela IoanaMihaela IoanaPopoviciGroven, BenjaminBenjaminGrovenWen, Liang GongLiang GongWenDutta, ShibeshShibeshDuttaBoemmels, JuergenJuergenBoemmelsTokei, ZsoltZsoltTokeiVan Elshocht, SvenSvenVan Elshocht2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26267Atomic layer deposition of ruthenium for advanced interconnect applicationsMeeting abstract