Dekkers, HaroldHaroldDekkersRagnarsson, Lars-AkeLars-AkeRagnarssonSchram, TomTomSchramHoriguchi, NaotoNaotoHoriguchi2021-10-252021-10-2520180021-8979https://imec-publications.be/handle/20.500.12860/30584Characterization of TaCl5-based ALD TaN films in metal gate stacksJournal articlehttps://doi.org/10.1063/1.5040840