Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

Lazzarino, FredericFredericLazzarinoPaolillo, SaraSaraPaolilloPeter, AntonyAntonyPeterDe Roest, DavidDavidDe RoestSeong, TaeGeunTaeGeunSeongWu, YizhiYizhiWuDecoster, StefanStefanDecosterRutigliani, VitoVitoRutiglianiLorusso, GianGianLorussoConstantoudis, VassiliosVassiliosConstantoudisVan Elshocht, SvenSvenVan ElshochtPiumi, DanieleDanielePiumiBarla, KathyKathyBarla2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28769Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresistProceedings paperhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2258040