Dehaerne, EnriqueEnriqueDehaerneDey, BappadityaBappadityaDeyBlanco, VictorVictorBlancoDavis, JesseJesseDavis2025-08-032025-08-0320251932-5150WOS:001523091400010https://imec-publications.be/handle/20.500.12860/46024Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic reviewJournal article10.1117/1.jmm.24.2.020901WOS:001523091400010NEURAL-NETWORK APPROACHCLASSIFICATIONCONTRASTVOLTAGE