Teugels, LieveLieveTeugelsOng, PatrickPatrickOngBoccardi, GuillaumeGuillaumeBoccardiWaldron, NiamhNiamhWaldronUsman Ibrahim, AnsarAnsarUsman IbrahimSiebert, Joerg MaxJoerg MaxSiebertLeunissen, Leonardus A.H.Leonardus A.H.Leunissen2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24609Improving defectivity for III-V CMP processes for <10 nm technology nodesProceedings paper