Van Den Heuvel, DieterDieterVan Den HeuvelJonckheere, RikRikJonckheereHendrickx, EricEricHendrickxCheng, ShauneeShauneeChengRonse, KurtKurtRonseAbe, TsukasaTsukasaAbeMagana, JohnJohnMaganaBret, TristanTristanBret2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18159Comparison between existing inspection techniques for EUV mask defectsProceedings paper