Intra-wafer CD-control in state-of-the-art lithography

Pollentier, IvanIvanPollentierBaerts, ChristinaChristinaBaertsMarschner, ThomasThomasMarschnerRonse, KurtKurtRonseGrozev, GrozdanGrozdanGrozevReybrouck, MarioMarioReybrouck2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3758Intra-wafer CD-control in state-of-the-art lithographyProceedings paper