Enhanced initial growth of atomic layer deposited metal oxides on hydrogen-terminated silicon

Frank, Martin M.Martin M.FrankChabal, Yves J.Yves J.ChabalGreen, MartinMartinGreenDelabie, AnneliesAnneliesDelabieBrijs, BertBertBrijsWilk, Glen D.Glen D.WilkHo, Mun-YeeMun-YeeHoda Rosa, Elisa B.O.Elisa B.O.da RosaBaumvol, Israel J.R.Israel J.R.BaumvolStedile, Fernanda C.Fernanda C.Stedile2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7580Enhanced initial growth of atomic layer deposited metal oxides on hydrogen-terminated siliconJournal article