High-k dielectrics and high work function metals for hybrid floating gate NAND flash applications

Lisoni, JuditJuditLisoniBreuil, LaurentLaurentBreuilBlomme, PieterPieterBlommeDe Stefano, FrancescaFrancescaDe StefanoAfanasiev, ValeriValeriAfanasievVan den Bosch, GeertGeertVan den BoschVan Houdt, JanJanVan Houdt2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24148High-k dielectrics and high work function metals for hybrid floating gate NAND flash applicationsProceedings paperhttp://ecst.ecsdl.org/content/61/2/281.abstract?sid=d1562664-be91-4d29-b0f2-d7ad4d61a6f3