Staggered pillar patterning using 0.33NA EUV lithography

De Simone, DaniloDaniloDe SimoneBlanc, RomualdRomualdBlancVan de Kerkhove, JeroenJeroenVan de KerkhoveTamaddon, Amir-HosseinAmir-HosseinTamaddonFallica, RobertoRobertoFallicaVan Look, LieveLieveVan LookRassoul, NouredineNouredineRassoulLazzarino, FredericFredericLazzarinoVandenbroeck, NadiaNadiaVandenbroeckVanelderen, PieterPieterVanelderenLorusso, GianGianLorussoVan Roey, FriedaFriedaVan RoeyCharley, Anne-LaureAnne-LaureCharleyVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonseLee, KilyoungKilyoungLeeLee, JunghyungJunghyungLeePark, SarohanSarohanParkLim, Chang-MoonChang-MoonLimPark, Chan-HaChan-HaPark2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/32835Staggered pillar patterning using 0.33NA EUV lithographyProceedings paperhttps://doi.org/10.1117/12.2515170