Florent, KarineKarineFlorentLavizzari, SimoneSimoneLavizzariDi Piazza, LucaLucaDi PiazzaPopovici, Mihaela IoanaMihaela IoanaPopoviciGroeseneken, GuidoGuidoGroesenekenVan Houdt, JanJanVan Houdt2021-10-242021-10-2420170018-9383https://imec-publications.be/handle/20.500.12860/28340Reliability study of ferroelectric Al:HfO2 thin films for DRAM and NAND applicationsJournal articlehttp://ieeexplore.ieee.org/document/8023826/