Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillars

Pak, MuratMuratPakZanders, WesleyWesleyZandersWong, PatrickPatrickWongHalder, SandipSandipHalder2022-02-222022-02-2220212590-0072WOS:000636282300003https://imec-publications.be/handle/20.500.12860/38975Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillarsJournal article10.1016/j.mne.2021.100082WOS:000636282300003