Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry

Tanksalvala, MichaelMichaelTanksalvalaPorter, Christina L.Christina L.PorterEsashi, YukaYukaEsashiWang, BinBinWangJenkins, Nicholas W.Nicholas W.JenkinsZhang, ZheZheZhangMiley, Galen P.Galen P.MileyKnobloch, Joshua L.Joshua L.KnoblochMcBennett, BrendanBrendanMcBennettHoriguchi, NaotoNaotoHoriguchiYazdi, SadeghSadeghYazdiZhou, JihanJihanZhouJacobs, Matthew N.Matthew N.JacobsBevis, Charles S.Charles S.BevisKarl, Robert M., Jr.Robert M., Jr.KarlJohnsen, PeterPeterJohnsenRen, DavidDavidRenWaller, LauraLauraWallerAdams, Daniel E.Daniel E.AdamsCousin, Seth L.Seth L.CousinLiao, Chen-TingChen-TingLiaoMiao, JianweiJianweiMiaoGerrity, MichaelMichaelGerrityKapteyn, Henry C.Henry C.KapteynMurnane, Margaret M.Margaret M.Murnane2022-04-252021-11-022022-04-082022-04-252021-01-272375-2548WOS:000614004600029https://imec-publications.be/handle/20.500.12860/38142Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometryJournal article10.1126/sciadv.abd9667WOS:000614004600029EUV imaging reflectometryMEDLINE:33571123