Minimizing plasma damage of CVD low-k materials by tuning a two step etch sequence.

Van Aelst, JokeJokeVan AelstBaklanov, MikhaïlMikhaïlBaklanovLe, Quoc ToanQuoc ToanLeStruyf, HerbertHerbertStruyfBoullart, WernerWernerBoullartVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9702Minimizing plasma damage of CVD low-k materials by tuning a two step etch sequence.Proceedings paper