Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

Lodha, Jayant K.Jayant K.LodhaPollentier, IvanIvanPollentierConard, ThierryThierryConardVallat, RemiRemiVallatDe Gendt, StefanStefanDe GendtArmini, SilviaSilviaArmini2022-11-102022-10-042022-11-1020220169-4332WOS:000859714800004https://imec-publications.be/handle/20.500.12860/40532Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithographyJournal article10.1016/j.apsusc.2022.154657WOS:000859714800004ATOMIC LAYER DEPOSITIONTITANIUM-DIOXIDETHIN-FILMSTIO2RUTHENIUMPRECURSORSILICON