Horiguchi, NaotoNaotoHoriguchiRagnarsson, Lars-AkeLars-AkeRagnarssonMertens, HansHansMertensArimura, HiroakiHiroakiArimuraRitzenthaler, RomainRomainRitzenthalerFranco, JacopoJacopoFrancoSchram, TomTomSchramDekkers, HaroldHaroldDekkersBarla, KathyKathyBarlaMocuta, DanDanMocuta2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28522Challenges and progresses in high-k metal gate for Silicon-based advanced CMOS transistor architectureProceedings paper