Delabie, AnneliesAnneliesDelabiePourtois, GeoffreyGeoffreyPourtoisCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtRagnarsson, Lars-AkeLars-AkeRagnarssonHeyns, MarcMarcHeynsFedorenko, YaninaYaninaFedorenkoSwerts, JohanJohanSwertsMaes, JanJanMaes2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12038Atomic layer deposition of hafnium silicate gate dielectric layersJournal article