Johanesen, H.H.JohanesenKenslea, A.A.KensleaWilliamson, M.M.WilliamsonKnowles, M.M.KnowlesKwakman, L.L.KwakmanLevi, S.S.LeviNishry, N.N.NishryAdan, O.O.AdanEnglard, I.I.EnglardVan Puymbroeck, JanJanVan PuymbroeckFelder, DanDanFelderGov, S.S.GovCohen, O.O.CohenTurovets, I.I.Turovets2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25436CD metrology for EUV lithography and etchProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7164505