Demonstration of phase-controlled Ni-FUSI CMOSFETs employing SiON dielectrics capped with sub-monolayer ALD HfSiON for low power applications

Yu, HongYuHongYuYuChang, Shou-ZenShou-ZenChangVeloso, AnabelaAnabelaVelosoLauwers, AnneAnneLauwersDelabie, AnneliesAnneliesDelabieEveraert, Jean-LucJean-LucEveraertSinganamalla, RaghunathRaghunathSinganamallaKerner, ChristophChristophKernerVrancken, ChristaChristaVranckenBrus, StephanStephanBrusAbsil, PhilippePhilippeAbsilHoffmann, ThomasThomasHoffmannBiesemans, SergeSergeBiesemans2021-10-162021-10-162007-09https://imec-publications.be/handle/20.500.12860/13251Demonstration of phase-controlled Ni-FUSI CMOSFETs employing SiON dielectrics capped with sub-monolayer ALD HfSiON for low power applicationsProceedings paper