Haider, AliAliHaiderDeng, ShaorenShaorenDengDevulder, WouterWouterDevulderMaes, Jan WillemJan WillemMaesGirard, Jean-MarcJean-MarcGirardKhalil El Hajjam, GabrielGabrielKhalil El HajjamKar, Gouri SankarGouri SankarKarOpsomer, KarlKarlOpsomerDetavernier, ChristopheChristopheDetavernierGivens, MichaelMichaelGivensGoux, LudovicLudovicGouxVan Elshocht, SvenSvenVan ElshochtDelhougne, RomainRomainDelhougneDelabie, AnneliesAnneliesDelabieCaymax, MattyMattyCaymaxSwerts, JohanJohanSwertsKhalil2022-02-222022-02-2220212633-5409WOS:000629901500012https://imec-publications.be/handle/20.500.12860/39005Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selectorJournal article10.1039/d0ma01014fWOS:000629901500012ATOMIC LAYER DEPOSITIONALKYLSILYL COMPOUNDSLIGAND-EXCHANGE((CH3)(3)SI)(2)TETELLURIUMGETEFILMSB