Toward successful integration of gap-filling ultralow-k dielectrics

Zhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeLesniewska, AlicjaAlicjaLesniewskaVerdonck, PatrickPatrickVerdonckHeylen, NancyNancyHeylenMurdoch, GayleGayleMurdochCroes, KristofKristofCroesTokei, ZsoltZsoltTokeiBoemmels, JuergenJuergenBoemmelsLefferts, S.S.LeffertsDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27662Toward successful integration of gap-filling ultralow-k dielectricsProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7507645